Graduate Seminar – I, Spring 2014
Wednesday, Feb. 5, 2014
"Atomic Layer Deposition at ETIC Nano Fabrication Laboratory of UMass Lowell," Thomas S. Ferraguto, director
The presentation will discuss importance of thin film technology in modern semiconductor nano electronics. Available technologies consist of physical vapor deposition (PVD), chemical vapor deposition (CVD), electrochemical deposition (PECVD), molecular beam epitaxy (MBE) and more recently, atomic layer deposition (ALD) among others. The methods to make antireflection coating for optoelectronic devices, ways to create flexible electronics, processing of MEMs will be highlighted in this talk. The goal of this discussion is to demonstrate the hardware used in making nanometer in size electronic devices.